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Ionyx Fingerprint Enhancement Technology (FET) |
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| The Ionyx FET System
is currently being developed in conjunction with patented technology
from the
University of Connecticut.
While design of the FET system progesses, research done by the
University has already proven the concept. The research documented
here was performed by the University under the direction of Charles
"Jim" Koch. Why, then, is Ionyx developing an FET system if one is already available? Similar to computer technology before the PC, Fingerprint Enhancement Technology currently can only be performed using large, expensive instruments not specifically designed for biological and forensic science. The University of Connecticut has patented methods of using this instrumentation for biometrics. As part of RBD Enterprises, the people at Ionyx have experience in engineering instrumentation for surface science. Together, we intend to bring to market a user-friendly ion implantation and analysis system designed specifically for the forensic lab. There are two parts to the system: The Ion Source (a compact ion implanter), and the Analysis System. The source uses a low energy ion beam to seal the fingerprint to the surface, yielding a permanent record of the print, suitable for handling and analysis. The analysis system applies spectroscopic techniques to image the print, and perform chemical analysis. The system chamber will be large enough to handle many common types of evidence, such as handguns, intact. The images displayed on this page are the property of the University of Connecticut
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The fingerprint on the left has been ion-implanted on a glass slide. Before implantation, the slide was cleaned with solvent. The print was lightly placed on the slide so that it was barely visible to the naked eye. You can now rub the print with a cotton swab without smudging it. There is another print visible on the top part of the slide. It was placed there prior to cleaning the slide with solvent and performing the ion implantation. It remains visible on the slide as evidence. |
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Traditional imaging can be destructive to latent prints. Ion
implantation produces samples that are not degraded by the imaging
process. The University of Connecticut produced the following
images from an ion implanted print. Both the images below are Scanning Electron Microscope (SEM) images of an ion implanted fingerprints. The rightmost image is further magnified.
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Fingerprint Enhancement Technology provides opportunities for structural and chemical detection previously unavailable to the forensic scientist. In this example, a fingerprint was placed on a gold plated piece of steel. The leftmost image is a contrast of the print after implantation. The green image is chemical map of the gold, the red is a chemical map of iron. The last image provides a composite.
While the images show the predominant chemical structure of the surface, further analysis can provide a much more complete chemical spectrum. Furthermore, since the fingerprint sample is mixed with the surface, the sample can be analyzed by a variety of methods, by different labs, all while maintaining the integrity of the print!
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The following images
illustrate the effects of ion implantation on a pistol magazine.
In this example, a fingerprint was placed on a pistol magazine. The leftmost image a secondary electron image of a print placed near hole "10" of the magazine. The rightmost image is a higher magnification of the print.
While smooth metal surfaces can be preserved and visualized well using methods such as cyanoacrylate fuming, they are often difficult to recover because of environmental factors (such as humidity) and handling before the fuming process. Firearms such as handguns prove especially difficult in print recovery because of materials, surface features, and handling. Ionyx and the University of Connecticut are examining ways in which FET may prove superior in recovering prints from surfaces where organic substances are present in insufficient quantities for visualization after chemical treatment, but leave a permanent mark after ion implantation. |
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